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Journal description
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Details for article 12 of 27 found articles
| Title: |
Experimental study of the quasi-breakdown failure mechanism in 4.5 nm-thick SiO2 oxides |
| Author: |
Goguenheim, D. Bravaix, A. Vuillaume, D. Mondon, F. Candelier, Ph. Jourdain, M. Meinertzhagen, A. |
| Appeared in: |
Microelectronics reliability |
| Paging: | Volume 39 (1999) nr. 2 pages 5 p. |
| Year: |
1999 |
| Contents: | |
| Publisher: |
Elsevier Science Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 12 of 27 found articles
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