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                                       Details for article 36 of 153 found articles
 
 
  Dynamic analyses in mass spectrometry of SF 6 plasma during etching of silicon
 
 
Title: Dynamic analyses in mass spectrometry of SF 6 plasma during etching of silicon
Author:
Appeared in: Microelectronics reliability
Paging: Volume 30 (1990) nr. 3 pages 620
Year: 1990
Contents:
Publisher: Pergamon Press plc
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 36 of 153 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands