Digital Library
Close Browse articles from a journal
 
<< previous    next >>
     Journal description
       All volumes of the corresponding journal
         All issues of the corresponding volume
           All articles of the corresponding issues
                                       Details for article 179 of 200 found articles
 
 
  The influence of hydrogen gas on the characteristics of amorphous silicon deposited by RF sputtering
 
 
Title: The influence of hydrogen gas on the characteristics of amorphous silicon deposited by RF sputtering
Author:
Appeared in: Microelectronics reliability
Paging: Volume 23 (1983) nr. 3 pages 1 p.
Year: 1983
Contents:
Publisher: Published by Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 179 of 200 found articles
 
<< previous    next >>
 
 Koninklijke Bibliotheek - National Library of the Netherlands