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Journal description
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Details for article 5 of 27 found articles
| Title: |
Concurrent characterization of GaN MOSHEMT gate leakage via electrical and thermoreflectance measurements |
| Author: |
Kortge, David Maize, Kerry Lyu, Xiao Bermel, Peter Ye, Peide Shakouri, Ali |
| Appeared in: |
Microelectronics reliability |
| Paging: | Volume 148 () nr. C pages p. |
| Year: |
2023 |
| Contents: | |
| Publisher: |
Elsevier Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 5 of 27 found articles
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