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                                       Details for article 108 of 115 found articles
 
 
  Study of migration and coalescence of voids driven by electric current stressing in solder interconnects using phase field simulation
 
 
Title: Study of migration and coalescence of voids driven by electric current stressing in solder interconnects using phase field simulation
Author: Liang, S.
Zhou, M.B.
Ke, C.B.
Wei, C.
Zhang, X.P.
Appeared in: Microelectronics reliability
Paging: Volume 138 () nr. C pages p.
Year: 2022
Contents:
Publisher: Elsevier Ltd
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 108 of 115 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands