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                                       Details for article 2 of 21 found articles
 
 
  A study on the interfacial adhesion energy between capping layer and dielectric for cu interconnects
 
 
Title: A study on the interfacial adhesion energy between capping layer and dielectric for cu interconnects
Author: Kim, Cheol
Son, Kirak
Kim, Gahui
Kim, Sungtae
Lee, Sol-Kyu
Lee, So-Yeon
Park, Young-Bae
Joo, Young-Chang
Appeared in: Microelectronics reliability
Paging: Volume 116 () nr. C pages p.
Year: 2021
Contents:
Publisher: Elsevier Ltd
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 2 of 21 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands