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                                       Details for article 59 of 116 found articles
 
 
  Low temperature migration of silicon through metal films. Importance of silicon-metal interface
 
 
Title: Low temperature migration of silicon through metal films. Importance of silicon-metal interface
Author:
Appeared in: Microelectronics reliability
Paging: Volume 11 (1972) nr. 6 pages 1 p.
Year: 1972
Contents:
Publisher: Published by Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 59 of 116 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands