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Details for article 9 of 11 found articles
| Title: |
The rate of Cu doped TiO2 interlayer effects on the electrical characteristics of Al/Cu:TiO2/n-Si (MOS) capacitors depend on frequency and voltage |
| Author: |
Erdal, M.O. Kocyigit, A. Yıldırım, M. |
| Appeared in: |
Microelectronics reliability |
| Paging: | Volume 106 () nr. C pages p. |
| Year: |
2020 |
| Contents: | |
| Publisher: |
Elsevier Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 9 of 11 found articles
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