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                                       Details for article 957 of 1093 found articles
 
 
  Standard and C-AFM tests to study the post-BD gate oxide conduction of MOS devices after current limited stresses
 
 
Title: Standard and C-AFM tests to study the post-BD gate oxide conduction of MOS devices after current limited stresses
Author:
Appeared in: Microelectronics reliability
Paging: Volume 44 (2004) nr. 9-11 pages 6 p.
Year: 2004
Contents:
Publisher: Elsevier Ltd
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 957 of 1093 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands