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                                       Details for article 727 of 1093 found articles
 
 
  NBTI degradation effect on advanced-process 45nm high-k PMOSFETs with geometric and process variations
 
 
Title: NBTI degradation effect on advanced-process 45nm high-k PMOSFETs with geometric and process variations
Author: Hatta, S.F. Wan Muhamad
Soin, N.
Hadi, D. Abd
Zhang, J.F.
Appeared in: Microelectronics reliability
Paging: Volume 50 (2010) nr. 9-11 pages 7 p.
Year: 2010
Contents:
Publisher: Elsevier Ltd
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 727 of 1093 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands