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Journal description
All volumes of the corresponding journal
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All articles of the corresponding issues
Details for article 375 of 1093 found articles
| Title: |
Electromigration in width transition copper interconnect |
| Author: |
Roy, Arijit Hou, Yuejin Tan, Cher Ming |
| Appeared in: |
Microelectronics reliability |
| Paging: | Volume 49 (2009) nr. 9-11 pages 4 p. |
| Year: |
2009 |
| Contents: | |
| Publisher: |
Elsevier Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 375 of 1093 found articles
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