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                                       Details for article 404 of 572 found articles
 
 
  Optimization of SiN X :H films deposited by PECVD for reliability of electronic, microsystems and optical applications
 
 
Title: Optimization of SiN X :H films deposited by PECVD for reliability of electronic, microsystems and optical applications
Author: Herth, E.
Legrand, B.
Buchaillot, L.
Rolland, N.
Lasri, T.
Appeared in: Microelectronics reliability
Paging: Volume 50 (2010) nr. 8 pages 4 p.
Year: 2010
Contents:
Publisher: Elsevier Ltd
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 404 of 572 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands