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                                       Details for article 395 of 425 found articles
 
 
  The influence of p-polysilicon gate doping on the dielectric breakdown of PMOS devices
 
 
Title: The influence of p-polysilicon gate doping on the dielectric breakdown of PMOS devices
Author: Innertsberger, G
Pompl, T
Kerber, M
Appeared in: Microelectronics reliability
Paging: Volume 41 (2001) nr. 7 pages 3 p.
Year: 2001
Contents:
Publisher: Elsevier Science Ltd
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 395 of 425 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands