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Details for article 751 of 3138 found articles
| Title: |
Degradation of RuO2 thin films in hydrogen atmosphere at temperatures between 150 and 250 °C |
| Author: |
Jelenkovic, Emil V Tong, K.Y Cheung, W.Y Wong, S.P |
| Appeared in: |
Microelectronics reliability |
| Paging: | Volume 43 (2003) nr. 1 pages 7 p. |
| Year: |
2003 |
| Contents: | |
| Publisher: |
Elsevier Science Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 751 of 3138 found articles
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