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Journal description
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Details for article 52 of 71 found articles
| Title: |
MOSFET channel resistance characterization from the triode region to impact ionization region with the inductive breakdown network |
| Author: |
Lee, Chie-In Lin, Wei-Cheng |
| Appeared in: |
Microelectronics reliability |
| Paging: | Volume 55 (2015) nr. 3-4 pages 5 p. |
| Year: |
2015 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 52 of 71 found articles
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