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Journal description
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Details for article 9 of 24 found articles
| Title: |
Enhancement of FinFET performance using 25-nm-thin sidewall spacer grown by atomic layer deposition |
| Author: |
Endo, Kazuhiko Ishikawa, Yuki Matsukawa, Takashi Liu, Yongxum O’uchi, Shin-ichi Sakamoto, Kunihiro Tsukada, Junichi Yamauchi, Hiromi Masahara, Meishoku |
| Appeared in: |
Solid-state electronics |
| Paging: | Volume 74 (2012) nr. C pages 6 p. |
| Year: |
2012 |
| Contents: | |
| Publisher: |
Elsevier Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 9 of 24 found articles
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