Bulk FinFET fabrication with new approaches for oxide topography control using dry removal techniques
Titel:
Bulk FinFET fabrication with new approaches for oxide topography control using dry removal techniques
Auteur:
Redolfi, A. Kubicek, S. Rooyackers, R. Kim, M.-S. Sleeckx, E. Devriendt, K. Shamiryan, D. Vandeweyer, T. Delande, T. Horiguchi, N. Togo, M. Wouters, J.M.D. Jurczak, M. Hoffmann, T. Cockburn, A. Gravey, V. Diehl, D.L.