Influence of processing and annealing steps on electrical properties of InAlN/GaN high electron mobility transistor with Al2O3 gate insulation and passivation
Title:
Influence of processing and annealing steps on electrical properties of InAlN/GaN high electron mobility transistor with Al2O3 gate insulation and passivation
Author:
Čičo, K. Gregušová, D. Kuzmík, J. Jurkovič, M. Alexewicz, A. di Forte Poisson, M.-A. Pogany, D. Strasser, G. Delage, S. Fröhlich, K.