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Journal description
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Details for article 21 of 35 found articles
| Title: |
Improvement on low-temperature deposited HfO2 film and interfacial layer by high-pressure oxygen treatment |
| Author: |
Yang, Po-Chun Chang, Ting-Chang Chen, Shih-Ching Su, Hsuan-Hsiang Lu, Jin Huang, Hui-Chun Gan, Der-Shin Ho, New-Jin |
| Appeared in: |
Solid-state electronics |
| Paging: | Volume 62 (2011) nr. 1 pages 4 p. |
| Year: |
2011 |
| Contents: | |
| Publisher: |
Elsevier Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 21 of 35 found articles
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