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                                       Details for article 2 of 13 found articles
 
 
  Al0.2Ga0.8As/In0.15Ga0.85As MOSPHEMT with low temperature LPD-deposited Al2O3 as gate dielectric
 
 
Title: Al0.2Ga0.8As/In0.15Ga0.85As MOSPHEMT with low temperature LPD-deposited Al2O3 as gate dielectric
Author: Basu, Sarbani
Singh, Pramod K.
Sze, Po-Wen
Wang, Yeong-Her
Appeared in: Solid-state electronics
Paging: Volume 54 (2010) nr. 8 pages 6 p.
Year: 2010
Contents:
Publisher: Elsevier Ltd
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 2 of 13 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands