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                                       Details for article 2 of 28 found articles
 
 
  All hot wire CVD TFTs with high deposition rate silicon nitride (3nm/s)
 
 
Title: All hot wire CVD TFTs with high deposition rate silicon nitride (3nm/s)
Author: Schropp, R.E.I.
Nishizaki, S.
Houweling, Z.S.
Verlaan, V.
van der Werf, C.H.M.
Matsumura, H.
Appeared in: Solid-state electronics
Paging: Volume 52 (2008) nr. 3 pages 5 p.
Year: 2008
Contents:
Publisher: Elsevier Ltd
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 2 of 28 found articles
 
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