A new CMP-less integration approach for highly scaled totally silicided (TOSI) gate bulk transistors based on the use of selective S/D Si epitaxy and ultra-low gates
Titel:
A new CMP-less integration approach for highly scaled totally silicided (TOSI) gate bulk transistors based on the use of selective S/D Si epitaxy and ultra-low gates
Auteur:
Müller, Markus Mondot, Alexandre Aimé, Delphine Froment, Benoît Talbot, Alexandre Roux, Julien-Marc Ribes, Guillaume Morand, Yves Descombes, Sophie Gouraud, Pascal Leverd, François Pokrant, Simone Toffoli, Alain Skotnicki, Thomas