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                                       Details for article 11 of 33 found articles
 
 
  Characterization of silicided shallow n + p junctions formed by P+ implantation into thin Ti films on Si substrates
 
 
Title: Characterization of silicided shallow n + p junctions formed by P+ implantation into thin Ti films on Si substrates
Author: Juang, M.H.
Cheng, H.C.
Appeared in: Solid-state electronics
Paging: Volume 35 (1992) nr. 10 pages 8 p.
Year: 1992
Contents:
Publisher: Published by Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 11 of 33 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands