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Journal description
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Details for article 6 of 13 found articles
| Title: |
Effect of implant and anneal parameters on boron-implanted Si as determined from ellipsometry and etching techniques |
| Author: |
Immorlica Jr., Anthony A. |
| Appeared in: |
Solid-state electronics |
| Paging: | Volume 25 (1982) nr. 11 pages 5 p. |
| Year: |
1982 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 6 of 13 found articles
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