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                                       Details for article 17 of 24 found articles
 
 
  Post-deposition annealing challenges for ALD Al0.5Si0.5Ox/n-GaN MOS devices
 
 
Title: Post-deposition annealing challenges for ALD Al0.5Si0.5Ox/n-GaN MOS devices
Author: Fernandes Paes Pinto Rocha, P.
Vauche, L.
Bedjaoui, M.
Cadot, S.
Mohamad, B.
Vandendaele, W.
Martinez, E.
Gauthier, N.
Pierre, F.
Grampeix, H.
Lefèvre, G.
Salem, B.
Sousa, V.
Appeared in: Solid-state electronics
Paging: Volume 209 () nr. C pages p.
Year: 2023
Contents:
Publisher: Elsevier Ltd
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 17 of 24 found articles
 
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