Post-deposition annealing challenges for ALD Al0.5Si0.5Ox/n-GaN MOS devices
Title:
Post-deposition annealing challenges for ALD Al0.5Si0.5Ox/n-GaN MOS devices
Author:
Fernandes Paes Pinto Rocha, P. Vauche, L. Bedjaoui, M. Cadot, S. Mohamad, B. Vandendaele, W. Martinez, E. Gauthier, N. Pierre, F. Grampeix, H. Lefèvre, G. Salem, B. Sousa, V.