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Fabrication and optimization of aggressively scaled Dual-Bit/Cell Split-Gate Floating-Gate flash memory cell in 55-nm node technology |
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Titel: |
Fabrication and optimization of aggressively scaled Dual-Bit/Cell Split-Gate Floating-Gate flash memory cell in 55-nm node technology |
Auteur: |
Chen, Hualun Xu, Zhaozhao Xiong, Wei Zhang, Jian Xu, Xiaojun Wang, Hui Dang, Yang Wang, Jinfeng Song, Wan Tian, Tian Liu, Donghua Qian, Wensheng Kong, Weiran |
Verschenen in: |
Solid-state electronics |
Paginering: |
Jaargang 194 () nr. C pagina's p. |
Jaar: |
2022 |
Inhoud: |
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Uitgever: |
Elsevier Ltd |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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