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Journal description
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Details for article 15 of 35 found articles
| Title: |
High-quality remote plasma enhanced atomic layer deposition of aluminum oxide thin films for nanoelectronics applications |
| Author: |
Khosla, Robin Schwarz, Daniel Funk, Hannes S. Guguieva, Kateryna Schulze, Jörg |
| Appeared in: |
Solid-state electronics |
| Paging: | Volume 185 () nr. C pages p. |
| Year: |
2021 |
| Contents: | |
| Publisher: |
Elsevier Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 15 of 35 found articles
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