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Simulation of the effect of parasitic channel height on characteristics of stacked gate-all-around nanosheet FET |
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Titel: |
Simulation of the effect of parasitic channel height on characteristics of stacked gate-all-around nanosheet FET |
Auteur: |
Choi, Yunho Lee, Kitae Yeon Kim, Kyoung Kim, Sihyun Lee, Junil Lee, Ryoongbin Kim, Hyun-Min Suh Song, Young Kim, Sangwan Lee, Jong-Ho Park, Byung-Gook |
Verschenen in: |
Solid-state electronics |
Paginering: |
Jaargang 164 () nr. C pagina's p. |
Jaar: |
2020 |
Inhoud: |
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Uitgever: |
Published by Elsevier B.V. |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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