Impact of pattern dependency of SiGe layers grown selectively in source/drain on the performance of 22nm node pMOSFETs
Titel:
Impact of pattern dependency of SiGe layers grown selectively in source/drain on the performance of 22nm node pMOSFETs
Auteur:
Wang, Guilei Moeen, M. Abedin, A. Xu, Yefeng Luo, Jun Guo, Yiluan Qin, Changliang Tang, Zhaoyun Yin, Haizhou Li, Junfeng Yan, Jiang Zhu, Huilong Zhao, Chao Chen, Dapeng Ye, Tianchun Kolahdouz, M. Radamson, Henry H.