Integration of highly-strained SiGe materials in 14nm and beyond nodes FinFET technology
Titel:
Integration of highly-strained SiGe materials in 14nm and beyond nodes FinFET technology
Auteur:
Wang, Guilei Abedin, Ahmad Moeen, Mahdi Kolahdouz, Mohammadreza Luo, Jun Guo, Yiluan Chen, Tao Yin, Huaxiang Zhu, Huilong Li, Junfeng Zhao, Chao Radamson, Henry H.