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Low inversion equivalent oxide thickness and enhanced mobility in MOSFETs with chlorine plasma interface engineering |
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Titel: |
Low inversion equivalent oxide thickness and enhanced mobility in MOSFETs with chlorine plasma interface engineering |
Auteur: |
Li, Chen-Chien Chang-Liao, Kuei-Shu Chen, Li-Ting Fu, Chung-Hao Hong, Hao-Zhi Li, Mong-Chi Chi, Wei-Fong Lu, Chun-Chang Ye, Zong-Hao Wang, Tien-Ko |
Verschenen in: |
Solid-state electronics |
Paginering: |
Jaargang 101 (2014) nr. C pagina's 5 p. |
Jaar: |
2014 |
Inhoud: |
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Uitgever: |
Elsevier Ltd |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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