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                                       Details for article 42 of 74 found articles
 
 
  Low temperature MOSFET technology with Schottky barrier source/drain, high-K gate dielectric and metal gate electrode
 
 
Title: Low temperature MOSFET technology with Schottky barrier source/drain, high-K gate dielectric and metal gate electrode
Author: Zhu, Shiyang
Yu, H.Y.
Chen, J.D.
Whang, S.J.
Chen, J.H.
Shen, Chen
Zhu, Chunxiang
Lee, S.J.
Li, M.F.
Chan, D.S.H.
Yoo, W.J.
Du, Anyan
Tung, C.H.
Singh, Jagar
Chin, Albert
Kwong, D.L.
Appeared in: Solid-state electronics
Paging: Volume 48 (2004) nr. 10-11 pages 6 p.
Year: 2004
Contents:
Publisher: Published by Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 42 of 74 found articles
 
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