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Low temperature MOSFET technology with Schottky barrier source/drain, high-K gate dielectric and metal gate electrode |
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Title: |
Low temperature MOSFET technology with Schottky barrier source/drain, high-K gate dielectric and metal gate electrode |
Author: |
Zhu, Shiyang Yu, H.Y. Chen, J.D. Whang, S.J. Chen, J.H. Shen, Chen Zhu, Chunxiang Lee, S.J. Li, M.F. Chan, D.S.H. Yoo, W.J. Du, Anyan Tung, C.H. Singh, Jagar Chin, Albert Kwong, D.L. |
Appeared in: |
Solid-state electronics |
Paging: |
Volume 48 (2004) nr. 10-11 pages 6 p. |
Year: |
2004 |
Contents: |
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Publisher: |
Published by Elsevier B.V. |
Source file: |
Elektronische Wetenschappelijke Tijdschriften |
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