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Journal description
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Details for article 9 of 19 found articles
| Title: |
On the primary process in plasma-chemical and photochemical vapor deposition from silane: An ab initio study of unimolecular decomposition of SiH4 in the lowest triplet state |
| Author: |
Tsuda, Minoru Oikawa, Setsuko Nagayama, Kiyoshi |
| Appeared in: |
Chemical physics letters |
| Paging: | Volume 118 (1985) nr. 5 pages 5 p. |
| Year: |
1985 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 9 of 19 found articles
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