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Journal description
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Details for article 254 of 339 found articles
| Title: |
Primary particle and agglomerate size measurement in chemical mechanical polishing (CMP) slurry using electrospray technique |
| Author: |
Yoo, Seong-Ho Woo, Keung-Shan Liu, Benjamin Y.H. |
| Appeared in: |
Journal of aerosol science |
| Paging: | Volume 29 (1998) nr. S2 pages 2 p. |
| Year: |
1998 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 254 of 339 found articles
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