|
| << previous | next >> |
Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 19 of 21 found articles
| Title: |
The simulation of radiation damage in oxide films by ion implantation |
| Author: |
Elfenthal, L. Schultze, J.W. Meyer, O. |
| Appeared in: |
Corrosion science |
| Paging: | Volume 29 (1989) nr. 2-3 pages 19 p. |
| Year: |
1989 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 19 of 21 found articles
| << previous | next >> |