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                                       Details for article 24 of 31 found articles
 
 
  SiCl3CCl3 as a novel precursor for chemical vapor deposition of amorphous carbon films
 
 
Title: SiCl3CCl3 as a novel precursor for chemical vapor deposition of amorphous carbon films
Author: Chang, Yu-Hsu
Wang, Lung-Shen
Chiu, Hsin-Tien
Lee, Chi-Young
Appeared in: Carbon
Paging: Volume 41 (2003) nr. 6 pages 6 p.
Year: 2003
Contents:
Publisher: Elsevier Science Ltd
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 24 of 31 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands