Inductively coupled remote plasma-enhanced chemical vapor deposition (rPE-CVD) as a versatile route for the deposition of graphene micro- and nanostructures
Titel:
Inductively coupled remote plasma-enhanced chemical vapor deposition (rPE-CVD) as a versatile route for the deposition of graphene micro- and nanostructures
Auteur:
Cuxart, M.G. Šics, I. Goñi, A.R. Pach, E. Sauthier, G. Paradinas, M. Foerster, M. Aballe, L. Fernandez, H. Moreno Carlino, V. Pellegrin, E.