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Journal description
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Details for article 1 of 17 found articles
| Title: |
A study on structural and electrical properties of low dielectric constant SiOC(–H) thin films deposited via PECVD |
| Author: |
Navamathavan, R. Nirmala, R. Kim, Chang Young Lee, Cheul-Ro Choi, Chi Kyu |
| Appeared in: |
Journal of physics and chemistry of solids |
| Paging: | Volume 73 (2012) nr. 5 pages 5 p. |
| Year: |
2012 |
| Contents: | |
| Publisher: |
Elsevier Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 1 of 17 found articles
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