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                                       Details for article 12 of 112 found articles
 
 
  Breakdown spots propagation in ultra-thin SiO2 films under repetitive ramped voltage stress using conductive atomic force microscopy
 
 
Title: Breakdown spots propagation in ultra-thin SiO2 films under repetitive ramped voltage stress using conductive atomic force microscopy
Author: Wu, You-Lin
Lin, Shi-Tin
Appeared in: Journal of physics and chemistry of solids
Paging: Volume 69 (2008) nr. 2-3 pages 5 p.
Year: 2008
Contents:
Publisher: Elsevier Ltd
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 12 of 112 found articles
 
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