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                                       Details for article 2 of 19 found articles
 
 
  Chemical vapor deposition precursor chemistry. 5. The photolytic laser deposition of aluminum thin films by chemical vapor deposition
 
 
Title: Chemical vapor deposition precursor chemistry. 5. The photolytic laser deposition of aluminum thin films by chemical vapor deposition
Author: Glass Jr, John A.
Hwang, Seong-Don
Datta, Saswatti
Robertson, Brian
Spencer, James T.
Appeared in: Journal of physics and chemistry of solids
Paging: Volume 57 (1996) nr. 5 pages 8 p.
Year: 1996
Contents:
Publisher: Published by Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 2 of 19 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands