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Influence of post fabrication annealing on device performance of InAlN/GaN high electron mobility transistors |
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Title: |
Influence of post fabrication annealing on device performance of InAlN/GaN high electron mobility transistors |
Author: |
Luo, Xin Cui, Peng Linewih, Handoko Cheong, Kuan Yew Xu, Mingsheng Chen, Siheng Wang, Liu Sun, Jiuji Dai, Jiacheng Xu, Xiangang Han, Jisheng |
Appeared in: |
Journal of physics and chemistry of solids |
Paging: |
Volume 187 () nr. C pages p. |
Year: |
2024 |
Contents: |
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Publisher: |
Elsevier Ltd |
Source file: |
Elektronische Wetenschappelijke Tijdschriften |
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