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Journal description
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Details for article 2 of 33 found articles
| Title: |
A model-based methodology for the analysis and design of atomic layer deposition processes—Part I: Mechanistic modelling of continuous flow reactors |
| Author: |
Holmqvist, A. Törndahl, T. Stenström, S. |
| Appeared in: |
Chemical engineering science |
| Paging: | Volume 81 (2012) nr. C pages 13 p. |
| Year: |
2012 |
| Contents: | |
| Publisher: |
Elsevier Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 2 of 33 found articles
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