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                                       Details for article 9 of 56 found articles
 
 
  Bottom-up filling in Cu electroless deposition using bis-(3-sulfopropyl)-disulfide (SPS)
 
 
Title: Bottom-up filling in Cu electroless deposition using bis-(3-sulfopropyl)-disulfide (SPS)
Author: Lee, Chang Hwa
Lee, Sang Chul
Kim, Jae Jeong
Appeared in: Electrochimica acta
Paging: Volume 50 (2005) nr. 16-17 pages 6 p.
Year: 2005
Contents:
Publisher: Elsevier Ltd
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 9 of 56 found articles
 
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