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Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 12 of 20 found articles
| Title: |
The influence of oxidizing agents on etching and passivation of silicon in KOH solution |
| Author: |
Xia, X.H Kelly, J.J |
| Appeared in: |
Electrochimica acta |
| Paging: | Volume 45 (2000) nr. 28 pages 9 p. |
| Year: |
2000 |
| Contents: | |
| Publisher: |
Elsevier Science Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 12 of 20 found articles
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