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Journal description
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Details for article 18 of 47 found articles
| Title: |
Etching mechanism and atomic structure of H-Si(111) surfaces prepared in NH4F |
| Author: |
Allongue, P. Kieling, V. Gerischer, H. |
| Appeared in: |
Electrochimica acta |
| Paging: | Volume 40 (1995) nr. 10 pages 1353-1360 |
| Year: |
1995 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 18 of 47 found articles
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