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                                       Details for article 44 of 62 found articles
 
 
  Plating Uniformity of Bottom-up Copper Pillars and Patterns for IC Substrates with Additive-assisted Electrodeposition
 
 
Title: Plating Uniformity of Bottom-up Copper Pillars and Patterns for IC Substrates with Additive-assisted Electrodeposition
Author: Chen, Yuanming
He, Wei
Chen, Xianming
Wang, Chong
Tao, Zhihua
Wang, Shouxu
Zhou, Guoyun
Moshrefi-Torbati, Mohamed
Appeared in: Electrochimica acta
Paging: Volume 120 (2014) nr. C pages 9 p.
Year: 2014
Contents:
Publisher: Elsevier Ltd
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 44 of 62 found articles
 
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