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                             47 gevonden resultaten
nr titel auteur tijdschrift jaar jaarg. afl. pagina('s) type
1 Changing from rapid thermal processing to rapid photothermal processing: what does it buy for a particular technology? Singh, R.
1998
3-4 p. 219-230
12 p.
artikel
2 Comparative studies on energy-dependence of reduced effective mass in quantum confined ZnS semiconductor nanocrystals prepared in polymer matrix Kolahi, Sanaz
2011
3-4 p. 294-301
8 p.
artikel
3 Controllable silicon nano-grass formation using a hydrogenation assisted deep reactive ion etching Mehran, M.
2011
3-4 p. 199-206
8 p.
artikel
4 Correlation between solar cell efficiency and minority carrier lifetime for batch processed multicrystalline Si wafers Jayakrishnan, R.
2011
3-4 p. 223-228
6 p.
artikel
5 Coupled simulation of gas flow and heat transfer in an RTP-system with rotating wafer Poscher, S.
1998
3-4 p. 201-205
5 p.
artikel
6 Deposition and crystallization of a-Si thin films by rapid thermal processing Girginoudi, S
1998
3-4 p. 287-292
6 p.
artikel
7 3D flowerlike ZnO micro-nanostructures via site-specific second nucleation in the zinc–ethylenediamine–hexamethylenetetramine tertiary system Yang, Lejiao
2011
3-4 p. 193-198
6 p.
artikel
8 Dopant diffusion studies and free carrier lifetimes during rapid thermal processing of semiconductors Nagabushnam, Rajan V.
1998
3-4 p. 207-218
12 p.
artikel
9 Dry etching of magnetic tunnel junctions monitored by spectroscopic reflectance Oubensaid, E.H.
2011
3-4 p. 278-286
9 p.
artikel
10 Editorial 1998
3-4 p. 167-
1 p.
artikel
11 Effect of K–N on the structural and optical properties of K–N co-doped ZnO film Zhao, Yue
2011
3-4 p. 257-260
4 p.
artikel
12 Effect of stress on silicide formation kinetics in thin film titanium–selicon system Nagabushnam, Rajan V
1998
3-4 p. 249-255
7 p.
artikel
13 Electron-beam assisted physical vapor deposition of polycrystalline silicon films Jamil, Sheba
2011
3-4 p. 287-293
7 p.
artikel
14 Epitaxial growth of SiGe layers for BiCMOS applications Regolini, J.L.
1998
3-4 p. 317-323
7 p.
artikel
15 Formation of contacts to shallow junctions using titanium silicide with diffusion barriers Zagozdzon-Wosik, W
1998
3-4 p. 243-247
5 p.
artikel
16 Formation of Si wells and pyramids on (100) surface as a result of Zn–Si interaction Wu, Yue
2011
3-4 p. 302-305
4 p.
artikel
17 Growth and physical properties of in situ phosphorus-doped RTLPCVD polycrystalline silicon thin films Kallel, S
1998
3-4 p. 299-302
4 p.
artikel
18 Influence of vapor phase pre-oxide-cleaning on the oxidation characteristics Froeschle, B
1998
3-4 p. 271-274
4 p.
artikel
19 Investigation of BiFe0.95Mn0.03Zn0.02O3/Bi3.15Nd0.85Ti2.9Zr0.1O12 heterostructure thin film fabricated by a chemical solution deposition technique Chen, Changchun
2011
3-4 p. 253-256
4 p.
artikel
20 Investigation of nano patches in Ni/n-Si micro Schottky diodes with new aspect Yeganeh, M.
2011
3-4 p. 266-273
8 p.
artikel
21 Modelling and off-line optimization of a 300 mm rapid thermal processing system Tillmann, A
1998
3-4 p. 181-186
6 p.
artikel
22 New methods of metrology data analysis during semiconductor processing and application to rapid thermal processing Boin, Manuela
1998
3-4 p. 195-200
6 p.
artikel
23 Patent report 1998
3-4 p. 343-350
8 p.
artikel
24 Perspectives on emissivity measurements and modeling in silicon Abedrabbo, S.
1998
3-4 p. 187-193
7 p.
artikel
25 Phosphorus diffusion from a spin-on doped glass (SOD) source during rapid thermal annealing Mathiot, D.
1998
3-4 p. 231-236
6 p.
artikel
26 Photoresponse and electrical characterization of photodiode based nanofibers ZnO and Si Yakuphanoglu, Fahrettin
2011
3-4 p. 207-211
5 p.
artikel
27 Rapid thermal annealing applied to the optimization of titanium oxide arc Lemiti, M.
1998
3-4 p. 331-334
4 p.
artikel
28 Rapid thermal annealing of Zr/SiGeC contacts Barthula, M
1998
3-4 p. 263-266
4 p.
artikel
29 Rapid thermal magnetic annealing as an emerging technology in field-annealing of thin magnetic films for recording heads Roozeboom, F.
1998
3-4 p. 303-315
13 p.
artikel
30 Rapid thermal oxidation of highly in situ phosphorus doped polysilicon thin films Kallel, S
1998
3-4 p. 275-279
5 p.
artikel
31 Rapid thermal oxidation of porous silicon for surface passivation Debarge, L
1998
3-4 p. 281-285
5 p.
artikel
32 Rapid thermal processing technology for the 21st century Timans, P.J.
1998
3-4 p. 169-179
11 p.
artikel
33 Selective doping of silicon by rapid thermal and laser assisted processes Besi-Vetrella, U
1998
3-4 p. 325-329
5 p.
artikel
34 Strain relaxation and dopant distribution in the rapid thermal annealing of Co with Si/Si1−x Ge x /Si heterostructure Miron, Y
1998
3-4 p. 257-261
5 p.
artikel
35 Structural, optical and electrical properties of n-ZnO/p-Si heterojunction prepared by ultrasonic spray Zebbar, N.
2011
3-4 p. 229-234
6 p.
artikel
36 Studying of physical characteristics and optimizing of gap filling for tungsten Chen, C.C.
2011
3-4 p. 235-240
6 p.
artikel
37 Studying the Raman spectra of Ag doped ZnO films grown by PLD Wang, L.N.
2011
3-4 p. 274-277
4 p.
artikel
38 Study of grains size distribution and electrical activity of heavily boron doped polysilicon thin films Bouridah, Hachemi
2011
3-4 p. 261-265
5 p.
artikel
39 Study of high-density AZO ceramic target Zhang, Jing
2011
3-4 p. 189-192
4 p.
artikel
40 Synthesis and characterization of Bi2Te3/polyaniline composites Li, Yong
2011
3-4 p. 219-222
4 p.
artikel
41 Synthesis and optical properties of Eu-doped ZnO nanosheets by hydrothermal method Yang, Jinghai
2011
3-4 p. 247-252
6 p.
artikel
42 Template-free synthesis of CuSCN and Cu2S crystallites with a facile hydrothermal method at different temperatures Li, Jiajia
2011
3-4 p. 306-310
5 p.
artikel
43 The effect of thickness of organic layer on electronic properties of Al/Rhodamine B/p-Si structure Soylu, Murat
2011
3-4 p. 212-218
7 p.
artikel
44 The growth and optical property of ZnO rods evolved from layered basic zinc acetate in humid atmosphere Qu, Xiurong
2011
3-4 p. 241-246
6 p.
artikel
45 The initial stages of Si thin deposits on foreign substrates in a rapid thermal chemical vapor phase reactor Angermeier, D.
1998
3-4 p. 293-297
5 p.
artikel
46 Ultra high temperature rapid thermal annealing of GaN Cao, X.A
1998
3-4 p. 267-270
4 p.
artikel
47 Ultra-shallow junction formation by spike annealing in a lamp-based or hot-walled rapid thermal annealing system: effect of ramp-up rate Agarwal, Aditya
1998
3-4 p. 237-241
5 p.
artikel
                             47 gevonden resultaten
 
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