|
Tijdschrift beschrijving
Alle jaargangen van het bijbehorende tijdschrift
Alle afleveringen van het bijbehorende jaargang
Alle artikelen van de bijbehorende aflevering
26 gevonden resultaten
| nr | titel | auteur | tijdschrift | jaar | jaarg. | afl. | pagina('s) | type |
| 1 | Binary optics: A VLSI-based microoptics technology |
Stern, Margaret B. |
1996 |
32 | 1-4 |
p. 369-388 20 p. |
artikel |
|
| 2 | Diffraction optics for X-ray imaging |
Schmahl, G. |
1996 |
32 | 1-4 |
p. 351-367 17 p. |
artikel |
|
| 3 | Downscaling ULSIs by using nanoscale engineering |
Asai, Shojiro |
1996 |
32 | 1-4 |
p. 31-48 18 p. |
artikel |
|
| 4 | Dry etching and induced damage |
van der Drift, E. |
1996 |
32 | 1-4 |
p. 241-253 13 p. |
artikel |
|
| 5 | Editorial Board |
1996 |
32 | 1-4 |
p. IFC- 1 p. |
artikel |
||
| 6 | Electron beam lithography—Resolution limits |
Broers, A.N. |
1996 |
32 | 1-4 |
p. 131-142 12 p. |
artikel |
|
| 7 | Electron beam technology—SEM to microcolumn |
Chang, T.H.P. |
1996 |
32 | 1-4 |
p. 113-130 18 p. |
artikel |
|
| 8 | Extraction, deposition, and displacement of atoms by STM |
Nakayama, T. |
1996 |
32 | 1-4 |
p. 191-201 11 p. |
artikel |
|
| 9 | Fabrication and uniformity issues in λ/4 shifted DFB laser arrays using e-beam generated contact grating masks |
Tennant, D.M. |
1996 |
32 | 1-4 |
p. 331-350 20 p. |
artikel |
|
| 10 | III–V Nanoelectronics |
Beaumont, Steven P. |
1996 |
32 | 1-4 |
p. 283-295 13 p. |
artikel |
|
| 11 | Nanofabrication by FIB |
Gamo, Kenji |
1996 |
32 | 1-4 |
p. 159-171 13 p. |
artikel |
|
| 12 | Nanolithography on hydrogen-terminated silicon by scanning-probe microscopy |
Schönenberger, Christian |
1996 |
32 | 1-4 |
p. 203-217 15 p. |
artikel |
|
| 13 | Nanosensors and molecular recognition |
Göpel, Wolfgang |
1996 |
32 | 1-4 |
p. 75-110 36 p. |
artikel |
|
| 14 | Pattern transfer: Self-assembled monolayers as ultrathin resists |
Xia, Younan |
1996 |
32 | 1-4 |
p. 255-268 14 p. |
artikel |
|
| 15 | Potential nanoelectronic integrated circuit technologies |
Randall, John |
1996 |
32 | 1-4 |
p. 15-30 16 p. |
artikel |
|
| 16 | Preface |
Vettiger, Peter |
1996 |
32 | 1-4 |
p. 1-2 2 p. |
artikel |
|
| 17 | Proximal probe lithography and surface modification |
Marrian, C.R.K. |
1996 |
32 | 1-4 |
p. 173-189 17 p. |
artikel |
|
| 18 | Quantum wires and dots for optical studies |
Forchel, A. |
1996 |
32 | 1-4 |
p. 317-330 14 p. |
artikel |
|
| 19 | Scaling silicon MOS devices to their limits |
Wind, S.J. |
1996 |
32 | 1-4 |
p. 271-282 12 p. |
artikel |
|
| 20 | Scanning probe microscopy for nanometer inspections and industrial applications |
Gutmannsbauer, W. |
1996 |
32 | 1-4 |
p. 389-409 21 p. |
artikel |
|
| 21 | SCREAM MicroElectroMechanical Systems |
MacDonald, Noel C. |
1996 |
32 | 1-4 |
p. 49-73 25 p. |
artikel |
|
| 22 | Single-electron devices |
Ahmed, Haroon |
1996 |
32 | 1-4 |
p. 297-315 19 p. |
artikel |
|
| 23 | Surface modification in the optical near field |
Krausch, G. |
1996 |
32 | 1-4 |
p. 219-228 10 p. |
artikel |
|
| 24 | The electron-beam and x-ray lithographic performance of the high resolution CAMP and ARCH family of chemically amplified resists |
Novembre, Anthony E. |
1996 |
32 | 1-4 |
p. 229-239 11 p. |
artikel |
|
| 25 | The nanoworld: chances and challenges |
Rohrer, H. |
1996 |
32 | 1-4 |
p. 5-14 10 p. |
artikel |
|
| 26 | X-ray nanolithography: Extension to the limits of the lithographic process |
Smith, Henry I. |
1996 |
32 | 1-4 |
p. 143-158 16 p. |
artikel |
26 gevonden resultaten