| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
A comparison of molecular beam epitaxy and ion-beam sputtering for growth of CdTe and HgCdTe films
|
Francombe, M.H.
|
|
1989
|
168 |
2 |
p. 307-323
17 p.
|
artikel
|
| 2 |
A microstructural study of oriented polymer-zinc diethyldithiocarbamate thin films
|
Norian, K.H.
|
|
1989
|
168 |
2 |
p. 353-362
10 p.
|
artikel
|
| 3 |
Analysis of the interface of bismuth with polycrystalline selenium thin films
|
Bernede, J.C.
|
|
1989
|
168 |
2 |
p. 249-261
13 p.
|
artikel
|
| 4 |
Author index
|
|
|
1989
|
168 |
2 |
p. 371-372
2 p.
|
artikel
|
| 5 |
Capacitance-voltage measurements on a p-type InSb metal/insulator/semiconductor structure with Si3N4 as the insulator
|
Ullrich, B.
|
|
1989
|
168 |
2 |
p. 157-163
7 p.
|
artikel
|
| 6 |
Characterization of an N-octadecylacrylamide Langmuir-Blodgett film for application as an electron beam resist
|
Miyashita, Tokuji
|
|
1989
|
168 |
2 |
p. L47-L49
nvt p.
|
artikel
|
| 7 |
Characterization of a plasma-sprayed YBaCuO superconductor
|
Wen, L.S.
|
|
1989
|
168 |
2 |
p. 231-238
8 p.
|
artikel
|
| 8 |
Characterization of surface layers produced by ion implantation of nitrogen in bulk aluminium
|
McCune, R.C.
|
|
1989
|
168 |
2 |
p. 263-280
18 p.
|
artikel
|
| 9 |
Contents of vol. 168
|
|
|
1989
|
168 |
2 |
p. 373-375
3 p.
|
artikel
|
| 10 |
Corrigendum
|
|
|
1989
|
168 |
2 |
p. 369-370
2 p.
|
artikel
|
| 11 |
Deposition of stoichiometric MoS2 thin films by pulsed laser evaporation
|
Donley, M.S.
|
|
1989
|
168 |
2 |
p. 335-344
10 p.
|
artikel
|
| 12 |
Effect of ion bombardment during growth on the electrical resistivity of magnetron-sputtered carbon films
|
Petrov, I.
|
|
1989
|
168 |
2 |
p. 239-248
10 p.
|
artikel
|
| 13 |
Effects of CoCrAlY coating on microstructural stability and creep behavior of a nickel-base superalloy
|
Chaki, T.K.
|
|
1989
|
168 |
2 |
p. 207-220
14 p.
|
artikel
|
| 14 |
Electrical properties of carbon black-polyimide thick films
|
Norian, K.H.
|
|
1989
|
168 |
2 |
p. 169-174
6 p.
|
artikel
|
| 15 |
Electronic structure of plasma-deposited amorphous Si-C alloy films
|
Tyczkowski, Jacek
|
|
1989
|
168 |
2 |
p. 175-184
10 p.
|
artikel
|
| 16 |
Factorial experimental investigation of plasma-enhanced chemical vapor deposition of silicon nitride thin films
|
Yoo, C.-S.
|
|
1989
|
168 |
2 |
p. 281-289
9 p.
|
artikel
|
| 17 |
Growth and characterization of ZnO films deposited on a monolithic Si3N4-SiO2-Si configuration
|
Panwar, B.S.
|
|
1989
|
168 |
2 |
p. 291-305
15 p.
|
artikel
|
| 18 |
Moisture patches in Al2O3/SiO2 quarterwave reflectors studied by fringes of equal chromatic order like experiments
|
Uhlig, H.
|
|
1989
|
168 |
2 |
p. L43-L46
nvt p.
|
artikel
|
| 19 |
On the kinetics of redistribution of vacancies in f.c.c. metal films under high rate heating
|
Markevich, M.I.
|
|
1989
|
168 |
2 |
p. 363-368
6 p.
|
artikel
|
| 20 |
Scratch adhesion test of magnetron-sputtered copper coatings on aluminium substrates: Effects of the surface preparation
|
Cailler, M.
|
|
1989
|
168 |
2 |
p. 193-205
13 p.
|
artikel
|
| 21 |
Structure and preferred orientations in ion-plated niobium films and correlation of the substrate bias voltage with calculated strain energies
|
Datta, P.K.
|
|
1989
|
168 |
2 |
p. 221-230
10 p.
|
artikel
|
| 22 |
Tailored target approach to the deposition of gradient index optical filters
|
Harker, A.B.
|
|
1989
|
168 |
2 |
p. 185-192
8 p.
|
artikel
|
| 23 |
Thallium thin film oxidation investigated by an optical absorption method
|
Pankajakshan, V.S.
|
|
1989
|
168 |
2 |
p. 165-168
4 p.
|
artikel
|
| 24 |
The direct photochemical vapour deposition of SiO2 from Si2H6 and N2O3 mixtures
|
Bhatnagar, Y.K.
|
|
1989
|
168 |
2 |
p. 345-352
8 p.
|
artikel
|
| 25 |
Thermal degradation of TiSi2/poly-Si gate electrodes
|
Nygren, S.
|
|
1989
|
168 |
2 |
p. 325-334
10 p.
|
artikel
|
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