| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
Advanced etching of silicon based on deep reactive ion etching for silicon high aspect ratio microstructures and three-dimensional micro- and nanostructures
|
Marty, F.
|
|
2005
|
36 |
7 |
p. 673-677
5 p.
|
artikel
|
| 2 |
Anodic bonding of glass and silicon wafers with an intermediate silicon nitride film and its application to batch fabrication of SPM tip arrays
|
Hsieh, Gen-Wen
|
|
2005
|
36 |
7 |
p. 678-682
5 p.
|
artikel
|
| 3 |
CMOS compatible bistable electromagnetic microvalve on a single wafer
|
Bintoro, Jemmy S.
|
|
2005
|
36 |
7 |
p. 667-672
6 p.
|
artikel
|
| 4 |
Electrical behaviour of fractal nanosized tin dioxide films prepared by electrodeposition for gas sensing applications
|
Kante, Ibrahima
|
|
2005
|
36 |
7 |
p. 639-643
5 p.
|
artikel
|
| 5 |
Magnetic QCA systems
|
Bernstein, G.H.
|
|
2005
|
36 |
7 |
p. 619-624
6 p.
|
artikel
|
| 6 |
Micromachining approach in fabricating of THz waveguide components
|
Pavolotsky, A.
|
|
2005
|
36 |
7 |
p. 683-686
4 p.
|
artikel
|
| 7 |
Nanomanipulation and aggregation limitations of self-assembling structural proteins
|
Layton, Bradley E.
|
|
2005
|
36 |
7 |
p. 644-649
6 p.
|
artikel
|
| 8 |
Perspectives and challenges in nanoscale device modeling
|
Iannaccone, Giuseppe
|
|
2005
|
36 |
7 |
p. 614-618
5 p.
|
artikel
|
| 9 |
Process optimization and characterization of silicon microneedles fabricated by wet etch technology
|
Wilke, N.
|
|
2005
|
36 |
7 |
p. 650-656
7 p.
|
artikel
|
| 10 |
Silicon periodic nano-structures obtained by laser exposure of nano-wires
|
Kakushima, K.
|
|
2005
|
36 |
7 |
p. 629-633
5 p.
|
artikel
|
| 11 |
Simulation of complex liquids in micropump
|
El-Sadi, Haifa
|
|
2005
|
36 |
7 |
p. 657-666
10 p.
|
artikel
|
| 12 |
Special issue on European Micro and Nano Systems (EMN04) held in Paris, 20–21 October, 2004
|
Courtois, Bernard
|
|
2005
|
36 |
7 |
p. 613-
1 p.
|
artikel
|
| 13 |
Structure study of electrodeposited ZnO nanowires
|
Leprince-Wang, Y.
|
|
2005
|
36 |
7 |
p. 625-628
4 p.
|
artikel
|
| 14 |
The aligned Si nanowires growth using MW plasma enhanced CVD
|
Dzbanovsky, N.N.
|
|
2005
|
36 |
7 |
p. 634-638
5 p.
|
artikel
|
Tijdschrift beschrijving